1800W semiconductor ultrasonic cleaners

Semiconductor industry is the core of the modern electronics industry, which is a silicon -based semiconductor industry materials industry . Although there are a variety of new semiconductor materials emerging , but more than 90 % of the semiconductor devices and circuits , particularly ultra- large scale integrated circuit (ULSI) are formed on the high purity silicon single crystal wafers and epitaxial wafers in .

The importance of semiconductor wafer cleaning industry in the early 1950s to the already aroused great attention , because the wafer surface contamination will seriously affect the performance, reliability, and yield of the device. With the rapid development of microelectronics technology and the improvement of people's material requirements , the impact of pollutants on the device has become even more prominent.

1970s developed a multi -channel electron multiplier in single-channel electron multiplier basis. Microchannel plate has a simple structure , high gain, fast response time and space imaging characteristics, which should be widely . It is mainly used in various types of image intensifier , night vision , quantum position detector , radiation amplifiers, field ion microscopy , ultra-fast wideband oscilloscope , such as photomultiplier . Microchannel plate electron multiplier is a multi- array is shimmer like a core component intensifier . MCP long and complex production process cycle , the apparent flaw is one of the key factors constraining MCP yield. In the manufacturing process of the MCP process, inevitably contaminated dust , metals , organic and inorganic . The contamination which is likely to cause surface defects and pores dirt, produce emission points, spots, dark spots , leading to decreased yield of the MCP , so that failure of the pipe as well as the quality is unstable , and therefore the use of ultrasonic cleaning technique in the manufacturing process of MCP removal of contaminants is important .

 

Common cleaning methods generally can not reach the hole , and the hole core material of the reaction products and other contaminants in the order process will have to repeat contamination. Whether it is the use of organic solvents or cleaning liquid are easy to introduce new sources of pollution , however, the use of ultrasonic cleaning technology but can be achieved without repeated contamination , but also in-depth MCP hole effect. Different materials and aperture should MCP frequency , intensity adjustable ultrasonic acoustic experiment to determine the actual process parameters. 6 ~ 12μmMCP the cleaning aperture , when the liquid medium is water and ethanol , the cavitation threshold can be about 1/3 W/cm2, intensity 10 ~ 20 W/cm2, the frequency of 20 ~ 120 kHz ultrasonic cleaning. Table 1 is an MCP with different plate numbers using some different frequency ultrasonic cleaning after apparent and electrical properties of the test results. Seen from the test results, for small particulate pollutants 1μm or less , should be used more than 40 kHz frequency ultrasonic cleaning.

 

1 , integrated design, compact , easy to operate ;

2, the flow of operation, avoid the product scratches ;

3 , configure filtering system , effective water conservation ;

4 , stainless steel mesh belt transmission, thorough cleaning effect , high cleaning efficiency ;

5 , oil-water separation and filtration system is configured to provide utilization cleaning agent ;

6 , simple operation, with manual and automatic conversion ;

7, PLC program control full automatic continuous step- washing and drying ;

Type	Internal size L*W*H (mm)	Outsize mm L*W*H (mm)	Frequency (Khz)	Power(W)	Heating(W)	Total power(W)	voltage
UCE-1036ST	680×530×360	800×650×700	20,28,33,40,80,130	1800	5000	6800	220V